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f <br /> ATTACHMENT B 6 <br /> August 1989 <br /> their use as soil-vent points would be cost effective and allow <br /> for increased remediation of hydrocarbon-impacted vadose zone <br /> soils. Monitoring wells MW-1, MW-2, MW-3 and MW-4 will he <br /> modified to serve both as vapor points, and groundwater <br /> monitoring wells. Figure 4 shows details of the modified <br /> monitoring wells. The wellheads will be capped off by a PVC <br /> plug, while an additional 2-inch PVC SCH 40 TEE and a ball valve <br /> with lateral 2-inch PVC piping connected to it will be installed. <br /> Lateral piping that will connect the modified monitoring wells <br /> (i.e. , the new vapor points) to the existing vapor lines to the <br /> treatment compound, will then be installed. Figure 5 shows the <br /> E � <br /> trenching schematic of the underground piping layout that will <br /> connect the proposed and existing vapor points to the treatment <br /> compound. <br /> As an alternative to activated-carbon treatment, a vacuum <br /> test was performed in ApKil, 19s9 to determine the feasibility of <br /> using an ORS Environmental Equipment catalytic Scavenger <br /> Incineration System (System) for vapor treatment. The results of <br /> the vacuum test showed that: <br /> o The total non-methane hydrocarbon concentrations (TPH) <br /> in the air being drawn from the vapor points and <br /> monitoring wells is approximately 39 percent of the <br /> Lower Explosive Limit (LEL, or 14,000 parts per <br /> million (ppm) = 100 percent LEL) . Enclosed in <br /> Attachment C are the laboratory results. This percent <br /> LEL of TPH in air is in the successful range of <br /> operation of the System, <br /> o The radius of influence of the vapor points was <br /> determined to be approximately 15 feet, yielding a <br /> total flow of 100 standard cubic feet per minute (scfm) <br /> through the vapor points and monitoring wells. A plot <br /> of the radius of influence of the vapor-extraction <br /> points is shown on Figure 5. <br /> ^�� GIif1C\ills';Cf'Fai <br /> I:CII"'omwl',INC. <br />