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SaInPling And Analytical' protocol <br />The f011owing protocols have been developed to incruse the;accuracy a . nd comlrnbility.of th'. <br />groundwater monitoring data. The purposes of establishing and following. the fit Protocols <br />II) to reduce sources of error that can be introduced . during Id are <br />in a consistent manner so that data sets MMPH49 and, (2) to collect =mples <br />are - comparable. nerefore, Project goals for <br />toinpar4bility and include* -following * <br />accui�� I the Procedures aescribed in* this Section to he <br />Crtent-possible. When field conditions necessitate a change from.the * <br />established protocols, the <br />MCCSSMY changes will be finplemented with Maintenwice, Of samPlIng s=uracy and data set <br />,compWability as Priorities. Ady modification to the Standard Procedures delineated -in this <br />Prot-OcOl necessitated ' �y field conditions and the -re2sons -will be noted on the Techniciaxis Daily <br />RCPOq (See Section 2-7)_ <br />Depth To Water Measunments <br />Depth to water InCaSurCInCnIS will be made in all the wells at the site prior to . inw, <br />and zarnpling� ging <br />Including wells that am not to be sampled- Th, measur==ts will b., <br />made fow <br />tiM4= a YCar Prior to initiating each sampling round. Tb= are no PieZOMOt=-at the site.: The- . <br />dcPth to vmter tacasurements, Will be made <br />cowecudvely, &'as -Short a time as pessibIq, to reduce.-.' 1" <br />Potenti'al enors duc to daily v'ariations in die water table. <br />DV&-t*-vV-Ater. (IDTW) will be zmeasured in the well to within 1/100 of a ' <br />conductivity -based water level indicator.- ' foot using 7 <br />'side of the top of Me=xeulents will be taken ftm d1c north or. m2rked <br />CaSiRg of each Well. The.-- marks on the casiuV hx�e been. smmmyed by a <br />probe is inSerte . d into the well through a*zpeci:al hole in the wen' pqzVS, dke Vrater IC - wl <br />caP. The mrkducd� probe and <br />cable --will be finsed in deioniwd Water before.and af L -r Measuring the fi= weA and aft= each <br />=bSCquent W4CU. Ike same Wafer level h4cator will be used in each we& Depth to , WZber <br />JmftsurO#=t Will. be recorded on a fieldabscr�afi=she�t_ <br />pies will be. collcftd from cdsting monitodng wells at Forward Landfill After <br />purging the water standing in the *WetL nds water Will be puxg e -d using. either dediaLted pumps <br />'or 4 SPeCW PM9C PMMP tim is d=.nUmRMW betwetn each wa 11,0 following procea= will <br />be used tO Purge the wata standing in the well ptior to sampling the Wells: <br />EM <br />JOY 14,200 <br />