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ORACLE #00044539 EF-1 ITEM #23 <br /> High Flow CSR j cXC <br /> i <br /> k INSERT TEE W104,I[ <br /> ONE ou7LE1 TO FOuNTx. <br /> Chao: �.:r:oui�titag luc��tian svi'arlc i;a sc,iais,cti ONE our n to sm, <br /> to tu`I vrEiria of the system v✓kT ar ourtEt ICE u.c+HE/ <br /> 3/:�'fxPr Ifll,Et COME <br /> t-'5e 3/4"Vr'aier{I::G � � m 0:EFNPT <br /> FVU;Z'C:;?Ea•C;jaSYrtdn}CAinRt=Ch'cns C:`.L:i;t{1C�fO ale WLET=C�. K/ <br /> o.�3lef c;�?i ih<z sysf�lll h 4Cre <br /> ` <br /> t .eSl:-X �' <br /> Gatlee iJ:C-'.A�'v-Y Gr�:}iCv r�1GC?':IIT@ t C?IlhBi:fiOr3i`✓'rF' I �m <br /> t-:�nde att:;r I'r;e,S�-k feecYNr;a Ic�is r(?Slvired <br /> ir�sioi€aeri:.ort'vl;ft COftr'Icrces 3'Icurtisinn c,awn. <br /> Al€ow 2-112"cloo.ronce belov,,the tali idge'of aueo <br /> Cc-'11ricJgr;f�1�1u^C:GIL r:n} I <br /> flush cclrtridges by t'onning wales ti;foughfiushinq <br /> valve fct five minutes of full low <br /> Tttis Sys}crl mus}be installed and mcal;folr:e<i <br /> according 10 Vic rt'larwiocluiei's ir�structior�s, <br /> indudifld insiallafion and replacenienf of`ilfer <br /> co i-idgeS <br /> she Cay 1811?il:onis C:r olh-1--r;=uiy:;'onccs rerr�e,ed <br /> or'reduced by this drink.:ng wafer system CIre not <br /> necessauiy in you!wales.Do not use%%ith wotvr <br /> fitat is rti?croLiolooically tinwifc or of ulJ,.nown <br /> gLx,jHy}%�hnu;culequote C€5infocliCm,IXIfO'd <br /> or afterSy""'C-M.SyS1G�1S C rh�4(f far cyst <br /> e.cYuC!iorl may be Used;ai';h tiisilr'ctec?'.vc:9er <br /> thal inoy conl6n gllisr'ct0lct cys`:s. <br /> System Tested and Certified <br /> by NSF <br /> international <br /> r NSF ANandSI Standards 42 d <br /> � i c s--- �� !- <br /> 1.:;, .r,.i 53 for the reduction of: <br /> ti�'orCrrr:xsl= ler t;rcr`.Or'of crc:e';ear alb=r eiat.�r,P Standard No.42— <br /> r:::rci s�.::•; rht,rr rept3Ga;��l�3ia n;en'; f,3lcr ra;S;;y<ae� �QENapy Aesthetic Effects <br /> 7 1 11 Er --d i < Chemicai Reduction <br /> Taste and Odor <br /> (- . ,ar n uI >tvt Chorine <br /> --�3dotLI. rc Stet -.,, -�``RnFvfvlechanicalRtrafion <br /> Particulate Class I <br /> ;va•�,ry i;;;r' � �tst. Standard No,53— <br /> i Health Effects <br /> M80 anicai Filtration <br /> Cyst <br /> AMI 40000 A <br /> - Everpure-SHURflo Southeast Asia <br /> 18 Boon Lay Way <br /> Everpure-SHURf10 India W1/2�0 404-I 10111 1 <br /> Green Boulevard,B-9/A.Ah Floor- WA T E R YOU CAN T R U S T o TradeHub 21,609966 <br /> Tower B Sector 62,Noida-201301 SINGAPORE <br /> TEL:91.120.419.9444 Visit aur website at www.everpure.com TEL:65.6795.2213 <br /> FAX:91.120.419.9400 FAX:65.6795.2219 <br /> EMAIL:indiacustomer@pentaiccom Pentair Filtration Solutions,LLC EMAIL:cseverpure@pentaiccom <br /> World Headquarters-Everpure/SHURflo <br /> Everpure-SHURAo Japan Inc. North and South America Sales Everpure-SHURflo Australia Everpure-SHURfIo Europe <br /> Hashimoto MN Bldg,7F Everpure-SHURflo China 1040 Muirfreld Dr. 2 Redwood Drive Pentair Water Belgium bvba <br /> 3.25-1 Hashimoto,Midori-ku 21 F Cloud 9 Plaza,No 1 1 18, Hanover Park,Illinois 60133 Notting Hill Industriepark Wolfstee <br /> Sagamihara-Shi Kanagawa 252.0143 Shanghai,200052 USA Victoria,3168 Toekomstlaan <br /> JAPAN CHINA TEL:840.942.1 153(US only) AUSTRALIA 30 B-2200 Herentals, BELGIUM <br /> TEL:81.(0)42.775.3011 TEL:86.21.3211.4588 TEL:630.307.3000 TEL:011.61.39.574.4000 TEL:+32.(0).14.283.500 <br /> FAX:8 1.(0)42.775.301 5 FAX;86.21.3211.4580 FAX:630.307.3030 FAX:011.61.39.562.7237 FAX:+32.(G).14.283.505 <br /> EMAIL:info@everpure.co.jp EMAIL:China.Water@Permir.com EMAIL:cseverpure@pentair.com EMAIL:au.everpure@penta9r.com EMAIL:sales@everpure-europe.com <br />