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2. CWC 791: Aqueous solution without metals Site 2010 Quantity lb 2014 uanti lb LBNI, 7,6742705 11130,058 SNUCA 2393900 1173022 For LBNL 2 I Building 7OA metal and electronic parts cleanins operations, Acrd Neutralization. This waste stream consists of acidic or caustic wastewaters, and is generated as a result of metal and electronic parts cleaning operations. The waste stream is generated primarily in three research buildings, building 2, 67 and 70A, where wastewater from multiple sinks in different laboratories is collected in a retention tank. The wastewater is subsequently treated and discharged to a POTW. The treatment consists of a neutralization process, which is authorized by the DTSC under the California Tiered Permit program (Permit -by -Rule for B2 and 70A. Conditional Authorization for B67). In January 2011 an operational changes was made to route treated water into the cooling towers for use as the makeup water. The reuse option for this water has resulted in approximately 500,000 gallons of water saved per year. For SNLlCA 2.2 Microstructures Laboratory In 2010 the Microstructures Laboratory , amulti-discipline user clean room facility used to conduct research in semiconductor micro -fabrication processing technology, generated 239,900 gallons of wastewater. The wastewater included rinsates from wet etching and from photolithographic developing; washing/rinsing of laboratory glassware and utensils; and finally drainage from our wafer dicing saw and spin rinse/dryers. The reduction in wastewater generation in the Microstructures Laboratory is due to a significant reduction in work that requires process water. In addition the !ab owner is emphasizing the need to reduce creating excess rinse water to all new lab users. It is anticipated this waste stream will continue to reduce. September 1, 2015 SB 14 Report II -3