COMPLIANCE INFO_PRE 2019 - Laserfiche WebLink

Home Browse Search

2. CWC 135: Unspecified aqueous solution Site 12010 quantity (lb) LLNL 14,863 2.1 Etching solution from B391 Site 2010 quantity Ob) LLNL 4,606 B3911ttu Matuiele: Eic!ioptic i Optic etching I Product: P optic rocess Etched o uc Spent etchant Off Site disposal FIGURE IV.2.1. B391 ETCHING WASTE GENERATION PROCESS This waste stream is generated periodically based on the volume of new optics required. The process has been optimized to generate the minimal amount of waste while producing the high quality optics required. For example, optics are batched to minimize solution change out between types and baths are reused up to 12 times before spent etchant must be discarded and replaced. During late 2009 and early 2010 a large number of new optics were processed. Another batch of new optics is currently scheduled for processing through early 2012. Beyond 2012, this process is expected to be operated at approximately 50% capacity to support ongoing NIF operations. In 2009, NIF started implementation of an optics repair process to extend the life of the optics. This operation continued to expand in 2010 and reduces both the need to acquire new replacement optics and the chemicals used to process them. SOURCE REDUCTION/POLLUTION PREVENTION EVALUATION Description of Measure: LLNL plans to continue existing best management practices to minimize this waste stream. No other source reduction measures are planned at this point. 2.2 Other etching activities Site 12010 quantity (lb) LLNL 1257 Approximately 216 pounds of CWC 135 waste were generated in the etching waste generation process described in Section 1.1 (Category C CWC 131). Another 41 pounds of waste were generated through a separate etching process at NIF that is already optimized for minimal waste generation. September l; 2011 SB 14 Plan 66 September 1, 2011 SB 14 Plan 67