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LLNL-AR-788093 <br /> External <br /> 1.2 CWC 122—NIF B392 Aqueous Basic Solution Rinse from Optics <br /> Cleaning Operation <br /> Site 2018 quantity (lb) <br /> LLNL 3,034 <br /> Acidic solution <br /> Optics to be added to process NaOH added to <br /> cleaned tank and circulated neutralize acid <br /> Spent <br /> Developer(pH 12) alkaline Off-site <br /> Acid drained added to tank solution disposal <br /> (CWC 122) <br /> Clean optics return <br /> to service <br /> FIGURE 111.1.2: NIF B392 AQUEOUS BASIC SOLUTION RINSE FROM OPTICS CLEANING <br /> OPERATION <br /> This process removes surface contaminants from etched optics using an acid cleaning station. <br /> Optics to be cleaned are transferred to the station and an acid solution is introduced into the <br /> process tank. The liquid is circulated to clean the optics and the acid is then drained. NaOH is <br /> added to the tank to neutralize any remaining acid, the optics are rinsed and the solution is <br /> drained. Finally, an alkaline developer solution is added and the optics are rinsed again. The <br /> aqueous basic solution from the neutralization and developer steps is sampled and either sent <br /> out as hazardous waste or discharged to sanitary sewer, depending on the analytical results <br /> and environmental approvals. <br /> SOURCE REDUCTION/POLLUTION PREVENTION EVALUATION <br /> Description of Measure: <br /> LLNL plans to continue with current source reduction measures, disposing of the <br /> aqueous waste offsite only when analytical results indicate that the wastewater cannot be <br /> discharged to sanitary sewer.No other source reduction measures are planned at this <br /> time. <br /> September 1, 2019 SB 14 Plan III-3 <br /> ESH-EFA-P2S-19-16592 <br />