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LLNL-AR-788093 <br /> External <br /> 4.2 B153 Buffered Oxide Etch Solution <br /> Site 2018 quantity (lb) <br /> LLNL 17 <br /> Raw Materials: CWC 791 <br /> Buffered hydrofluoric acid Aqueous acidic solution Off-site <br /> used for etching glass Disposal <br /> FIGURE IV.4.2: GLASS ETCHING PROCESS <br /> This waste is generated from glass and silica etching activities. An aqueous acid solution <br /> consisting of an ammonium fluoride buffer and hydrofluoric acid is used for fabrication of <br /> microfluidic devices for mechanical and medical applications. <br /> SOURCE REDUCTION/POLLUTION PREVENTION EVALUATION <br /> Description of Measure: <br /> LLNL plans to continue existing best management practices to minimize this waste <br /> stream. No other source reduction/pollution prevention measures are planned. <br /> September 1, 2019 SB 14 Plan IV-4 <br /> ESH-EFA-P2S-19-16592 <br />