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- Weli[eveenl anrd <br /> Wafer Sampling Field Survay <br /> i <br /> Project I ' a-- O site; Date: { <br /> well: k1- Sampling Team: <br /> Well Development Method: <br /> Sampling Method: � <br /> DOscribe Equipment Docontamination lore Sampling: _ <br /> Won Developmant/wett SmPlIng Data -� <br /> Total Well Hatter level <br /> Depth: feet Time: Before pumping: <br /> Water Casing Diameter Volume <br /> Column Z= ti A-lat»h flume Eal:toc tom. E me <br /> m feet x .i6 0.65 -14-• <br /> - Depth Purging From: feet. Time purging begins: /o:eo <br /> Notes on Initial Discharge <br /> .Time Volume Rei CUnductivit�v <br /> 93/0 <br /> 4TV 46 Y4 C? <br /> — Time Field Parameter Measurement Begins: <br /> Reo affil Ren J2 Rev #3 Ren 14 <br /> - pH . 30 3/ <br /> - Conductivity o � -'•'" <br /> Temperature (F) - — �3Z,�y'•� <br /> Presample Collection Gallons Purged: <br /> Time Sample Collection Berlins: L;1 'a <br /> -.-_T .-- <br /> P <br /> .ime-Sam leCollection-Ends-: ------- ----------- ----- <br /> Total Gallons Purged: nn <br /> -. <br /> Comments* sO - <br /> c. <br /> ;Q � <br />