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JM Equipment <br /> Chemical Oxidation Test Report <br />' to the soil, creating a high demand of hydrogen peroxide and ozone The amount of oxidant to <br /> clean the organic in the soil may be 10 to 15 times the oxidant applied during the test The <br /> oxidant should be injected continuously to treat the soil and groundwater maintaining an oxidant <br />' level in the ground water An Applied Process Technology, Inc Pulseox 100 in-situ device <br /> would be recommended for this purpose <br /> Since the tests, as conducted during this tieatment program, resulted in a small radius of <br /> influence, Applied recommends that future treatments employing hydrogen peroxide and ozone <br />' be injected into the subsurface utilizing Max-Ox points We believe that the installation of Max- <br /> Ox would create a larger radius of influence and expedite remedial activities The infection <br /> points should be located at a target depth nearest to the most contaminated zone <br />' Max-Ox points consist of two points at each injection location, one for peroxide delivery and one <br /> for ozone delivery and are typically constructed of 1/2 inch diameter stainless steel in order to <br /> ensure compatibility with the chemicals to be injected Based on the soils that exist onsite, the <br />' effective radius-of-influence at each nested injection well could be greater than the standard <br /> construction used in MW-9 The Max-Ox points have demonstrated radius of influences of at <br /> least 15 to 20 feet However, an air sparge test needs to be conducted to verify the actual radius <br />' of influence prior to system installation Max-Ox points are available from Applied Process <br /> Technology, Inc <br /> The Max-Ox, used in conjuction with a PulseOx ISCO device would effectively push the <br /> hydrogen peroxide and ozone in to the subsurface to interface the soil particles with adsorbed- <br /> phase hydrocarbons Since the peroxide and ozone would be continuously injected, the <br />' concentration of oxidants would not need to be increased <br /> 1 <br /> 1 <br /> 1 <br /> 1 <br /> Applied Process Tmhnology,hu, Confidential Information <br /> 09/20/04 <br /> APT So 018 wwav apt aKEL r coni Page 30 of t l <br /> 1 <br />