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Groundwater Data Gaps Site Investigation <br /> 8 March 2019 <br /> Page 2 <br /> DATA GAPS <br /> The following data gaps were identified based on the third quarter 2018 monitoring event data: <br /> Site 3: <br /> 1. Vertical extent of volatile organic compounds (VOCs) in groundwater near monitoring <br /> well W-002 (Figure 4). <br /> 2. The extent of VOCs in groundwater downgradient of the source area at Site 3 (Figure 4). <br /> 3. The western extent of VOCs in groundwater north of the drainage channel.5.6 Historically, <br /> monitoring wells defined the extent of VOCs in this area; however, many of these wells <br /> have been damaged or destroyed and can no longer be sampled(Figure 4). <br /> Site 4: <br /> 4. The downgradient extent of vinyl chloride at Site 4 southwest of W-109 (Figure 5). <br /> 5. Lateral and vertical extent of the VOC plume to the north at Site 4 and upgradient of the <br /> source area(Figure 5). <br /> 6. The western extent of VOCs in groundwater at Site 4(Figure 5). <br /> 7. The vertical extent of VOCs in groundwater downgradient of monitoring well W-004 <br /> (Figure 5). <br /> 8. The vertical and lateral extent of VOCs west and downgradient of W-020 (Figure 5). <br /> Central Area: <br /> 9. Central Area connection or lack thereof of the detections of VOCs in groundwater at <br /> 816-MW2, W-302, and W-300. Based on the currently available data, it is unknown if the <br /> detections at these wells are part of a single connected groundwater plume or are isolated <br /> impacts (Figure 6). <br /> s A Draft Work Plan for Well Abandonment,Repair and Installation at Site 3 was previously provided to DTSC and <br /> the RWQCB (see footnote 6). The data gaps investigation described in this GMWP supersedes the previous Site 3 <br /> draft work plan. <br /> 6 ERS,2015. Draft Work Plan for Well Abandonment,Repair,and Installation at Site 3,West Complex,Rough and <br /> Ready Island,Port of Stockton,Stockton,California.August. <br /> 2019_0308_RRI_Revised Data Gaps Investigation Memo <br /> engineers I scientists I innovators <br />