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COMPLIANCE INFO_PRE 2019
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COMPLIANCE INFO_PRE 2019
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Last modified
4/9/2020 10:11:37 AM
Creation date
10/31/2018 12:45:24 PM
Metadata
Fields
Template:
EHD - Public
ProgramCode
2200 - Hazardous Waste Program
File Section
COMPLIANCE INFO
FileName_PostFix
PRE 2019
RECORD_ID
PR0514115
PE
2249
FACILITY_ID
FA0003934
FACILITY_NAME
Lawrence Livermore National Lab - Site 300
STREET_NUMBER
15999
Direction
W
STREET_NAME
CORRAL HOLLOW
STREET_TYPE
RD
City
TRACY
Zip
95376
CURRENT_STATUS
01
SITE_LOCATION
15999 W CORRAL HOLLOW RD
P_LOCATION
99
P_DISTRICT
005
QC Status
Approved
Scanner
SJGOV\dsedra
Supplemental fields
FilePath
\MIGRATIONS\C\CORRAL HOLLOW\15999\PR0514115\COMPLIANCE INFO 2015.PDF
QuestysFileName
COMPLIANCE INFO 2015
QuestysRecordDate
2/14/2018 5:54:51 PM
QuestysRecordID
3615097
QuestysRecordType
12
QuestysStateID
1
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EHD - Public
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2 2 Microstructures Laboratory <br />Site 2014 uati ib <br />SNL/CA 117,022 <br />Raw Materials: <br />DI water <br />Variety of acids <br />FIGURE II.2.2: <br />Rinse water <br />from etching <br />operations <br />cwc �sl <br />Liquid with <br />pH< 2 <br />Treated by <br />neutralization and <br />discharged to a <br />POTW <br />MICRQSTRTJCTURE LABORATORY WASTE GENERATION PROCESS <br />The Microshuctures Laboratory is amulti-discipline clean room facility used to conduct <br />research in semiconductor micro -fabrication processing technology. The Microstructures Lab <br />is dedicated to the fabrication of small electronic, mechanical, optical and flow system <br />devices and experiments in Material Science. These devices are fabricated using <br />photolithography, vacuum thin film deposition, spin casting, chemical vapor deposition, wet <br />chemical and dry plasma etching. <br />Operations that generate waste water to the Liquid Effluent Control System (LEGS) include <br />,*msates from the Bldg. 968 Neutralization Unit. This waste is generated from wet etching <br />and from photolithographic developing. Other waste water discharges include <br />washing/rinsing of laboratory glassware, utensils, and ftnally drainage from our wafer dicing <br />saw and spin rinse/dryers. 4 <br />SOURCE REDUCTION/POLLVI'IONPBEVENTION EVALUATION <br />Description of Measure: <br />SNL/CA has experi <br />enced a significant decrease in work requiring process water in the <br />clean room. Additionally, the principal investigator provides water conservation <br />training and awareness to all clean room users as well as providing suggestions of how <br />to minimize producing excess rinse water. Users continue to conduct initial washing <br />and rinsing of glassware and utensils over the bath and the second (final) rinse at the <br />sink. This measure reduces the volume of water used for washing and rinsing of <br />glassware and utensils significantly. No other source reduction measures are planned <br />at this time. <br />September 1, 2015 SB14 Plan <br />
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